US 11,891,690 B2
Molybdenum thin films by oxidation-reduction
Feng Q. Liu, San Jose, CA (US); Alexander Jansen, San Jose, CA (US); and Mark Saly, Santa Clara, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Aug. 11, 2020, as Appl. No. 16/990,303.
Claims priority of provisional application 62/885,814, filed on Aug. 12, 2019.
Prior Publication US 2021/0047726 A1, Feb. 18, 2021
Int. Cl. C23C 16/18 (2006.01); C23C 16/455 (2006.01); H01L 21/285 (2006.01); H01L 21/02 (2006.01)
CPC C23C 16/18 (2013.01) [C23C 16/45527 (2013.01); C23C 16/45553 (2013.01); H01L 21/0234 (2013.01); H01L 21/02175 (2013.01); H01L 21/02205 (2013.01); H01L 21/28568 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A method of forming a molybdenum film, the method comprising:
exposing a substrate surface to an organometallic molybdenum precursor and an oxidant to form a molybdenum oxide film, the organometallic molybdenum precursor comprising one or more of CpMo(CO)2(NO) or MeCpMo(CO)2(NO); and
reducing the molybdenum oxide film to form a molybdenum film.