US 11,890,640 B2
Monolayer deposition of nanoparticles
Harold Frank Greer, Los Angeles, CA (US); Rehan Kapadia, Los Angeles, CA (US); Angelica Saenz, Pasadena, CA (US); and David Webber, Los Angeles, CA (US)
Assigned to Nanoclear Technologies, Inc., Pasadena, CA (US)
Appl. No. 17/794,429
Filed by NanoClear Technologies, Inc., Pasadena, CA (US)
PCT Filed Jan. 21, 2021, PCT No. PCT/US2021/014368
§ 371(c)(1), (2) Date Jul. 21, 2022,
PCT Pub. No. WO2021/150720, PCT Pub. Date Jul. 29, 2021.
Claims priority of provisional application 62/963,589, filed on Jan. 21, 2020.
Prior Publication US 2023/0095274 A1, Mar. 30, 2023
Int. Cl. B05D 1/18 (2006.01); C09D 7/40 (2018.01); B05D 3/12 (2006.01); B05D 7/00 (2006.01)
CPC B05D 1/185 (2013.01) [B05D 3/12 (2013.01); B05D 7/54 (2013.01); C09D 7/66 (2018.01)] 20 Claims
OG exemplary drawing
 
1. A method of forming a monolayer of nanoparticles, the method comprising:
forming an activated surface on a substrate;
contacting the activated surface with a fluid comprising nanoparticles;
forming a plurality of monolayers of nanoparticles in the fluid on the activated surface, the plurality of monolayers of nanoparticles comprising a first monolayer of nanoparticles bonded to the activated surface and a second monolayer of nanoparticles bonded to the first monolayer of nanoparticles, wherein:
a first bond between a first nanoparticle of the first monolayer and the activated surface is characterized by a first bond strength,
the first bond does not comprise a covalent bond,
a second bond between two adjacent nanoparticles of the first monolayer is characterized by a second bond strength,
a third bond between the first nanoparticle of the first monolayer and an adjacent nanoparticle of the second monolayer is characterized by a third bond strength,
the first bond strength is greater than the second bond strength,
the second bond strength is greater than the third bond strength, and
the first bond strength is less than a threshold value; and
removing monolayers of the plurality of monolayers while retaining the first monolayer to form the substrate with the first monolayer, wherein each nanoparticle in the first monolayer is bonded to another nanoparticle in the first monolayer.