US D1,010,805 S
Respiratory mask
Dae Ick Han, Daejeon (KR)
Assigned to SHEMA CO., LTD., Daejeon (KR)
Filed by SHEMA CO., LTD., Daejeon (KR)
Filed on Jul. 29, 2020, as Appl. No. 29/744,426.
Claims priority of application No. 30-2020-0004009 (KR), filed on Jan. 30, 2020.
Term of patent 15 Years
LOC (14) Cl. 29 - 02
U.S. Cl. D24—110.1
OG exemplary drawing
 
The ornamental design for a respiratory mask, as shown and described.