US 11,870,252 B2
Consolidated filter arrangement for devices in an RF environment
Phillip Criminale, Livermore, CA (US); Steve E. Babayan, Los Altos, CA (US); Scott Edmonson, San Jose, CA (US); Phillip R. Sommer, Newark, CA (US); Dan A. Marohl, San Jose, CA (US); and Chris Blank, Gilroy, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Oct. 26, 2020, as Appl. No. 17/080,579.
Application 15/870,488 is a division of application No. 14/555,435, filed on Nov. 26, 2014, granted, now 9,872,341, issued on Jan. 16, 2018.
Application 17/080,579 is a continuation of application No. 15/870,488, filed on Jan. 12, 2018, granted, now 10,820,378.
Prior Publication US 2021/0059018 A1, Feb. 25, 2021
Int. Cl. H02J 13/00 (2006.01); H02J 3/14 (2006.01); H05B 3/00 (2006.01); H05B 1/02 (2006.01); H02M 5/257 (2006.01); H02M 1/092 (2006.01)
CPC H02J 13/00017 (2020.01) [H02J 3/14 (2013.01); H02J 13/00004 (2020.01); H02J 13/00022 (2020.01); H02J 13/00026 (2020.01); H02M 5/2576 (2013.01); H05B 1/0233 (2013.01); H05B 3/0047 (2013.01); H02J 2310/14 (2020.01); H02M 1/092 (2013.01); Y02B 70/3225 (2013.01); Y02B 90/20 (2013.01); Y04S 20/222 (2013.01); Y04S 40/126 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method comprising:
generating, by a processing device that is external to a radio frequency (RF) environment and based on a process recipe, a first signal and a second signal;
converting the first signal into an alternative signal;
transmitting, over a non-conductive communication link, the alternative signal to a converter within the RF environment within a processing chamber of a substrate processing system;
converting the alternative signal into a third signal by the converter inside the RF environment within the processing chamber;
controlling a first plurality of elements disposed within the RF environment within the processing chamber via one or more first devices disposed within the RF environment within the processing chamber using the third signal; and
controlling a second plurality of elements of the substrate processing system via one or more second devices of the substrate processing system using the second signal, the second devices and the second plurality of elements being separate from the processing device, wherein at least one of the one or more second devices is configured to control power provided to one or more of the second plurality of elements, wherein the one or more second devices and the second plurality of elements are disposed outside of the processing chamber and are disposed outside of the RF environment, and wherein the first plurality of elements, via the one or more first devices and a first power supply, and the second plurality of elements, via the one or more second devices and a second power supply, are controlled substantially simultaneously by the processing device based on the process recipe.