US 11,869,764 B2
Substrate processing apparatus, substrate processing method and non-transitory computer-readable recording medium
Akinori Tanaka, Toyama (JP); Hideto Tateno, Toyama (JP); and Sadayoshi Horii, Toyama (JP)
Assigned to KOKUSAI ELECTRIC CORPORATION, Tokyo (JP)
Filed by KOKUSAI ELECTRIC CORPORATION, Tokyo (JP)
Filed on Sep. 13, 2022, as Appl. No. 17/943,843.
Application 17/943,843 is a continuation of application No. 15/918,858, filed on Mar. 12, 2018, granted, now 11,476,112.
Prior Publication US 2023/0077197 A1, Mar. 9, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01L 21/02 (2006.01); C23C 16/40 (2006.01); H01L 21/67 (2006.01); C23C 16/56 (2006.01); C23C 16/455 (2006.01); C23C 16/448 (2006.01); H01L 21/31 (2006.01); C23C 16/44 (2006.01); H01J 37/32 (2006.01)
CPC H01L 21/02271 (2013.01) [C23C 16/401 (2013.01); C23C 16/4412 (2013.01); C23C 16/4485 (2013.01); C23C 16/45561 (2013.01); C23C 16/56 (2013.01); H01J 37/32449 (2013.01); H01L 21/0262 (2013.01); H01L 21/02164 (2013.01); H01L 21/02222 (2013.01); H01L 21/02282 (2013.01); H01L 21/02326 (2013.01); H01L 21/02337 (2013.01); H01L 21/31 (2013.01); H01L 21/67017 (2013.01); H01L 21/67109 (2013.01); H01L 21/67253 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A substrate processing apparatus comprising:
a process chamber capable of accommodating a substrate;
a process gas supply system configured to supply a process gas into the process chamber via a process gas supply pipe;
an exhaust pipe configured to exhaust an inner atmosphere of the process chamber;
a gas concentration sensor configured to be capable of detecting a first concentration which is a concentration of the process gas in the process gas supply pipe or detecting a second concentration which is a concentration of the process gas contained in an exhaust gas in the exhaust pipe or detecting both of the first concentration and the second concentration; and
a controller configured to be capable of performing: (a) controlling the process gas supply system to start a supply of the process gas into the process chamber at a predetermined flow rate; and (b) controlling the process gas supply system to reduce the predetermined flow rate into the process chamber or to stop the supply of the process gas into the process chamber when an amount of the process gas consumed in the process chamber, which is calculated based on a value of the first concentration and a value of the second concentration detected by the gas concentration sensor, becomes equal to or lower than a predetermined value.
 
15. A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform:
(a) supplying a process gas into a process chamber via a process gas supply pipe connected thereto with a substrate accommodated in the process chamber and exhausting the process gas from the process chamber via an exhaust pipe connected thereto;
(b) detecting a first concentration which is a concentration of the process gas in the process gas supply pipe or a second concentration which is a concentration of the process gas contained in an exhaust gas in the exhaust pipe; and
(c) controlling a process gas supply system to reduce a predetermined flow rate into the process chamber or to stop a supply of the process gas into the process chamber when an amount of the process gas consumed in the process chamber, which is calculated based on a value of the first concentration and a value of the second concentration detected by a gas concentration sensor, becomes equal to or lower than a predetermined value.