US 11,868,043 B2
Imprint compositions with passivated nanoparticles and materials and processes for making the same
Amita Joshi, Fremont, CA (US); Andrew Ceballos, Santa Clara, CA (US); Kenichi Ohno, Sunnyvale, CA (US); Rami Hourani, Santa Clara, CA (US); and Ludovic Godet, Sunnyvale, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 16, 2021, as Appl. No. 17/527,819.
Claims priority of provisional application 63/115,440, filed on Nov. 18, 2020.
Prior Publication US 2022/0155678 A1, May 19, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. C08K 9/02 (2006.01); G03F 7/00 (2006.01); C09D 7/40 (2018.01); C09D 7/62 (2018.01); G03F 7/16 (2006.01); C09D 7/65 (2018.01)
CPC G03F 7/0002 (2013.01) [C09D 7/62 (2018.01); C09D 7/65 (2018.01); C09D 7/67 (2018.01); G03F 7/167 (2013.01)] 19 Claims
 
1. An imprint composition, comprising:
a plurality of passivated nanoparticles, wherein:
each passivated nanoparticle comprises a core and a shell;
the core comprises a metal oxide;
the shell comprises a passivation material comprising a block copolymer, wherein the block copolymer comprises polystyrene-bloc k-poly(4-vinylpyridine) (PS-b-P4VP), polystyrene b-polyethylene oxide (PS-b-PEO), polystyrene-b-polybutadiene (PS-b-PB), polystyrene b-polymethylmethacrylate (PS-b-PMMA), polystyrene-block-polybutadiene-bloc k-poly-styrene, a poloxamer, poly(isoprene-block-dimethylaminoethyl methacrylate) (PI-b-PDMAEMA), poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide) (PEO-PPO-PEO), or any combination thereof; and
the shell has a thickness of about 0.1 nm to about 50 nm;
one or more solvents;
a surface ligand;
an additive; and
an acrylate.