US 11,868,041 B2
Pellicle and method of using the same
Chue San Yoo, Hsinchu (TW); Hsin-Chang Lee, Hsinchu (TW); Pei-Cheng Hsu, Hsinchu (TW); and Yun-Yue Lin, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on Oct. 18, 2022, as Appl. No. 18/047,342.
Application 18/047,342 is a continuation of application No. 16/867,280, filed on May 5, 2020, granted, now 11,506,971.
Application 16/867,280 is a continuation of application No. 15/591,640, filed on May 10, 2017, granted, now 10,670,959, issued on Jun. 2, 2020.
Prior Publication US 2023/0061320 A1, Mar. 2, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 1/62 (2012.01); G03F 1/64 (2012.01); G03F 7/20 (2006.01)
CPC G03F 1/64 (2013.01) [G03F 1/62 (2013.01); G03F 7/2004 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A pellicle frame comprising:
a check valve, wherein the check valve is configured to permit gas flow from an interior of a pellicle to an exterior of the pellicle; and
a bottom surface of the pellicle frame is flat having only a single recess therein, wherein a bottom surface of the pellicle frame is free of an adhesive; and
a gasket configured to fit within the single recess.