US 11,867,646 B2
Total reflection x-ray fluorescence spectrometer
Makoto Kambe, Takatsuki (JP); Kazuhiko Omote, Akishima (JP); Toshifumi Higuchi, Takatsuki (JP); Tsutomu Tada, Takatsuki (JP); Hajime Fujimura, Takatsuki (JP); Masahiro Nonoguchi, Akishima (JP); Licai Jiang, Auburn Hills, MI (US); Boris Verman, Auburn Hills, MI (US); and Yuriy Platonov, Auburn Hills, MI (US)
Assigned to RIGAKU CORPORATION, Tokyo (JP)
Appl. No. 18/034,886
Filed by Rigaku Corporation, Akishima (JP)
PCT Filed Nov. 1, 2021, PCT No. PCT/JP2021/040221
§ 371(c)(1), (2) Date May 2, 2023,
PCT Pub. No. WO2022/118585, PCT Pub. Date Jun. 9, 2022.
Claims priority of application No. 2020-199366 (JP), filed on Dec. 1, 2020.
Prior Publication US 2023/0400423 A1, Dec. 14, 2023
Int. Cl. G01N 23/223 (2006.01)
CPC G01N 23/223 (2013.01) 8 Claims
OG exemplary drawing
 
1. A total reflection X-ray fluorescence spectrometer, comprising:
an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the X-ray irradiation direction;
a reflective optic that has an effective width in the direction parallel to the surface of the sample, and orthogonal to the X-ray irradiation direction, that is larger than the effective width of the electron beam focal point, and has a curved cross section in a plane containing the X-ray irradiation direction and being perpendicular to the surface of the sample; and
a plurality of detectors that are directed toward the surface of the sample, are arranged in a row in the direction orthogonal to the X-ray irradiation direction, and are configured to measure intensities of fluorescent X-rays generated from the sample irradiated with X-rays focused by the reflective optic.