CPC C23C 16/45561 (2013.01) [C23C 16/52 (2013.01); H01J 37/32192 (2013.01); H01J 37/32357 (2013.01); H01J 37/32449 (2013.01); H01J 37/32834 (2013.01); H01J 2237/3321 (2013.01); H01L 21/31 (2013.01)] | 6 Claims |
1. A gas supply apparatus comprising:
a treatment vessel having a substrate therein to perform processing on the substrate;
a venting mechanism configured to vent an inside of the treatment vessel to form a vacuum atmosphere;
a gas supply path including an upstream flow path to which a gas is supplied from a gas source, and a plurality of branch paths formed by branching a downstream side of the upstream flow path into a plurality of paths, each of the branch paths being connected to the treatment vessel;
first valves respectively provided in the branch paths in order to divert the gas supplied to the upstream flow path to the branch paths, each of the first valves having a variable opening degree without being closed completely;
a second valve provided in the upstream flow path to supply the gas or shut off the supply of the gas to a downstream side thereof;
a pressure sensor configured to detect a pressure in the treatment vessel; and
an abnormality detector configured to detect an abnormality in the downstream side of the second valve in the gas supply path based on the detected pressure in the treatment vessel.
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