US 11,866,821 B2
Substrate support cover for high-temperature corrosive environment
Shuran Sheng, Saratoga, CA (US); Lin Zhang, San Jose, CA (US); Jiyong Huang, Rockwall, TX (US); Joseph C. Werner, Santa Clara, CA (US); Stanley Wu, San Ramon, CA (US); Mahesh Adinath Kanawade, Santa Clara, CA (US); Yikai Chen, San Jose, CA (US); Yixing Lin, Saratoga, CA (US); and Ying Ma, Castro Valley, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Mar. 2, 2020, as Appl. No. 16/806,656.
Claims priority of provisional application 62/851,461, filed on May 22, 2019.
Prior Publication US 2020/0370174 A1, Nov. 26, 2020
Int. Cl. C23C 16/44 (2006.01); C01F 17/265 (2020.01); C23C 16/458 (2006.01); C01F 17/229 (2020.01); C01F 17/218 (2020.01)
CPC C23C 16/4404 (2013.01) [C01F 17/265 (2020.01); C23C 16/4405 (2013.01); C23C 16/4581 (2013.01); C23C 16/4585 (2013.01); C01F 17/218 (2020.01); C01F 17/229 (2020.01)] 10 Claims
OG exemplary drawing
 
1. A processing chamber, comprising:
a chamber body;
a substrate support disposed in the chamber body, the substrate support comprising a surface and a side surface connected to the surface; and
a substrate support cover removably disposed on the substrate support and configured to be picked up from the substrate support by a substrate transfer robot, the substrate support cover comprising;
a bulk material layer: and
a coating of a fluoride material, wherein the coating is exposed to a processing region in the processing chamber;
wherein the bulk layer further comprises a first surface in contact with the surface of the substrate support, a second surface opposite the first surface, a third surface extending from the first surface and facing the side surface of the substrate support, a fourth surface extending from the second surface and opposite the third surface, and a fifth surface connecting the third surface and the fourth surface.
 
9. A method, comprising:
removing a substrate from a processing chamber;
placing by a substrate transfer robot a substrate support cover on a substrate support disposed in the processing chamber, the substrate support cover comprises a bulk material layer, and a coating of a fluoride material, wherein the coating is exposed to a processing region in the processing chamber, wherein the bulk layer further comprises a first surface in contact with the surface of the substrate support, a second surface opposite the first surface, a third surface extending from the first surface and facing the side surface of the substrate support, a fourth surface extending from the second surface and opposite the third surface, and a fifth surface connecting the third surface and the fourth surface,
performing a cleaning process in the processing chamber while the substrate support cover is on the substrate support, the fluoride material of the substrate support cover being exposed to a cleaning gas or cleaning species during the cleaning process.