CPC C23C 16/4404 (2013.01) [C01F 17/265 (2020.01); C23C 16/4405 (2013.01); C23C 16/4581 (2013.01); C23C 16/4585 (2013.01); C01F 17/218 (2020.01); C01F 17/229 (2020.01)] | 10 Claims |
1. A processing chamber, comprising:
a chamber body;
a substrate support disposed in the chamber body, the substrate support comprising a surface and a side surface connected to the surface; and
a substrate support cover removably disposed on the substrate support and configured to be picked up from the substrate support by a substrate transfer robot, the substrate support cover comprising;
a bulk material layer: and
a coating of a fluoride material, wherein the coating is exposed to a processing region in the processing chamber;
wherein the bulk layer further comprises a first surface in contact with the surface of the substrate support, a second surface opposite the first surface, a third surface extending from the first surface and facing the side surface of the substrate support, a fourth surface extending from the second surface and opposite the third surface, and a fifth surface connecting the third surface and the fourth surface.
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9. A method, comprising:
removing a substrate from a processing chamber;
placing by a substrate transfer robot a substrate support cover on a substrate support disposed in the processing chamber, the substrate support cover comprises a bulk material layer, and a coating of a fluoride material, wherein the coating is exposed to a processing region in the processing chamber, wherein the bulk layer further comprises a first surface in contact with the surface of the substrate support, a second surface opposite the first surface, a third surface extending from the first surface and facing the side surface of the substrate support, a fourth surface extending from the second surface and opposite the third surface, and a fifth surface connecting the third surface and the fourth surface,
performing a cleaning process in the processing chamber while the substrate support cover is on the substrate support, the fluoride material of the substrate support cover being exposed to a cleaning gas or cleaning species during the cleaning process.
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