US 11,866,682 B1
Culture chamber and culture method
Yoko Ejiri, Tsukuba (JP); Satoru Ayano, Tsukuba (JP); Naoto Fukuhara, Tsukuba (JP); Hideki Taniguchi, Yokohama (JP); and Takanori Takebe, Yokohama (JP)
Assigned to CORNING INCORPORATED, Corning, NY (US)
Filed by CORNING INCORPORATED, Corning, NY (US); and Public University Corporation Yokohama City University, Yokohama (JP)
Filed on Sep. 30, 2022, as Appl. No. 17/957,743.
Application 17/957,743 is a division of application No. 16/668,701, filed on Oct. 30, 2019, granted, now 11,473,046.
Claims priority of application No. 2013-120915 (JP), filed on Jun. 7, 2013.
This patent is subject to a terminal disclaimer.
Int. Cl. C12M 1/32 (2006.01); C12M 1/24 (2006.01)
CPC C12M 23/08 (2013.01) [C12M 23/12 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A culture chamber comprising:
a plurality of recesses, each recess formed of a bottom portion and an opening portion, wherein:
the bottom portion having a depth D1 comprises a hemispherical shape or a truncated cone shape,
the opening portion having a depth D2 is defined by a wall that surrounds an area from a boundary between the opening portion and the bottom portion to an end of each of the recesses, the wall comprising a taper angle of 1 degree to 20 degrees,
an equivalent diameter of the boundary is from 50 μm to 1 mm and a depth D from a bottom of the bottom portion to the end of each of the recesses is from 0.6 or more times to 3 or less times of the equivalent diameter, wherein the depth D equals D1+D2,
the wall defining the opening portion forms a surface continuous to the bottom portion, and an inclination of the surface continuous to the bottom portion changes at the boundary, and
wherein an area between two adjacent recesses is flat and a distance between the two recesses is in a range from 5 μm to 50 μm.