US 11,866,334 B2
Systems and methods for high yield and high throughput production of graphene
Vig Sherrill, Kingston, TN (US); Mira Baraket, Oak Ridge, TN (US); and Richard Philpott, Cambridge (GB)
Assigned to General Graphene Corporation, Knoxville, TN (US)
Filed by General Graphene Corporation, Knoxville, TN (US)
Filed on Dec. 7, 2022, as Appl. No. 18/076,430.
Application 18/076,430 is a continuation of application No. 18/076,427, filed on Dec. 7, 2022.
Application 18/076,427 is a continuation of application No. 18/076,426, filed on Dec. 7, 2022.
Application 18/076,426 is a continuation of application No. 18/076,421, filed on Dec. 7, 2022.
Application 18/076,421 is a continuation of application No. 18/075,509, filed on Dec. 6, 2022.
Application 18/075,509 is a continuation of application No. 18/075,485, filed on Dec. 6, 2022.
Application 18/075,485 is a continuation of application No. 18/075,479, filed on Dec. 6, 2022.
Application 18/075,479 is a continuation of application No. 18/008,457, previously published as PCT/US2022/035043, filed on Jun. 27, 2022.
Claims priority of provisional application 63/292,533, filed on Dec. 22, 2021.
Prior Publication US 2023/0212013 A1, Jul. 6, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/02 (2006.01); C23C 16/26 (2006.01); C01B 32/184 (2017.01); B01J 19/18 (2006.01); C01B 32/182 (2017.01); C01B 32/186 (2017.01); B01J 19/24 (2006.01); C01B 32/05 (2017.01); B82Y 40/00 (2011.01)
CPC C01B 32/182 (2017.08) [B01J 19/18 (2013.01); B01J 19/245 (2013.01); C01B 32/05 (2017.08); C01B 32/184 (2017.08); C01B 32/186 (2017.08); C23C 16/0209 (2013.01); C23C 16/26 (2013.01); B82Y 40/00 (2013.01); C01B 2204/02 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A method for forming graphene, said method comprising:
scavenging, in presence of a substrate gas scavenging composition and a scavenging temperature, a substrate sheet to produce an at least partially contamination-depleted surface;
annealing, in presence of an annealing gas composition and an annealing temperature, said substrate sheet having said at least partially contamination-depleted surface to produce an annealed surface;
producing graphene, in presence of a producing composition and a producing temperature, on said substrate sheet having said annealed surface to produce a graphene deposited surface; and
cooling, in absence of an active heat source disposed adjacent to said substrate sheet and in presence of said substrate gas scavenging composition, said substrate sheet having said graphene deposited surface to produce a relatively cool surface.