US 11,866,333 B2
Systems and methods for high yield and high throughput production of graphene
Vig Sherrill, Kingston, TN (US); Mira Baraket, Oak Ridge, TN (US); and Richard Philpott, Cambridge (GB)
Assigned to General Graphene Corporation, Knoxville, TN (US)
Filed by General Graphene Corporation, Knoxville, TN (US)
Filed on Dec. 7, 2022, as Appl. No. 18/076,421.
Application 18/076,421 is a continuation of application No. 18/075,509, filed on Dec. 6, 2022.
Application 18/075,509 is a continuation of application No. 18/075,485, filed on Dec. 6, 2022, granted, now 11,753,304.
Application 18/075,485 is a continuation of application No. 18/075,479, filed on Dec. 6, 2022, granted, now 11,718,527.
Application 18/075,479 is a continuation of application No. 18/008,457, granted, now 11,718,526, previously published as PCT/US2022/035043, filed on Jun. 27, 2022.
Claims priority of provisional application 63/292,533, filed on Dec. 22, 2021.
Prior Publication US 2023/0193456 A1, Jun. 22, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/02 (2006.01); C23C 16/26 (2006.01); C01B 32/182 (2017.01); C01B 32/186 (2017.01); C01B 32/184 (2017.01); B01J 19/24 (2006.01); C01B 32/05 (2017.01); B01J 19/18 (2006.01); B82Y 40/00 (2011.01)
CPC C01B 32/182 (2017.08) [B01J 19/18 (2013.01); B01J 19/245 (2013.01); C01B 32/05 (2017.08); C01B 32/184 (2017.08); C01B 32/186 (2017.08); C23C 16/0209 (2013.01); C23C 16/26 (2013.01); B82Y 40/00 (2013.01); C01B 2204/02 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for forming graphene, said method comprising:
pretreating a surface for processing using one or more pretreating flowrates of a substrate gas scavenging gas composition, in presence of one or more pretreating temperatures, to produce a contaminant-depleted surface; and
treating said contaminant-depleted surface using one or more treating flowrates of an annealing gas composition, in presence of one or more treating temperatures, to produce an annealed surface.