US 11,862,524 B2
Overlay mark design for electron beam overlay
Inna Steely-Tarshish, Yokneam Ilit (IL); Stefan Eyring, Weilburg (DE); Mark Ghinovker, Yoqneam Ilit (IL); Yoel Feler, Haifa (IL); Eitan Hajaj, Ashqelon (IL); Ulrich Pohlmann, Jena (DE); Nadav Gutman, Zichron Ya'aqov (IL); Chris Steely, Yokneam Ilit (IL); Raviv Yohanan, Qiryat Motzkin (IL); and Ira Naot, Milpitas, CA (US)
Filed by KLA Corporation, Milpitas, CA (US)
Filed on Sep. 28, 2021, as Appl. No. 17/487,842.
Claims priority of provisional application 63/215,561, filed on Jun. 28, 2021.
Prior Publication US 2022/0415725 A1, Dec. 29, 2022
Int. Cl. H01L 21/66 (2006.01); H01L 23/544 (2006.01)
CPC H01L 22/30 (2013.01) [H01L 23/544 (2013.01); H01L 22/12 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A target comprising:
an array of cells comprising a first cell, a second cell, a third cell, and a fourth cell, each comprising a periodic structure with a pitch, wherein the periodic structure includes a first section and a second section, separated by a first gap; and
an electron beam overlay target disposed in a center of the array of cells comprising the first cell, the second cell, the third cell, and the fourth cell.