CPC H01L 22/12 (2013.01) [G01N 23/04 (2013.01); G01N 23/2251 (2013.01); G06F 18/214 (2023.01); G06N 20/00 (2019.01); H01L 22/26 (2013.01)] | 20 Claims |
1. A method comprising:
obtaining, by a processor, sensor data associated with a deposition process performed in a process chamber to deposit a film stack on a surface of a substrate, wherein the film stack comprises a plurality of layers of a first material and a plurality of layers of a second material;
obtaining metrology data associated with the film stack;
training a first machine-learning model based on the sensor data and the metrology data, wherein the first machine-learning model is trained to generate predictive metrology data associated with layers of the first material; and
training a second machine-learning model based on the sensor data and the metrology data, wherein the second machine-learning model is trained to generate predictive metrology data associated with layers of the second material.
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