CPC H01J 37/3423 (2013.01) [C23C 14/14 (2013.01); C23C 14/165 (2013.01); C23C 14/3407 (2013.01); C23C 14/35 (2013.01); H01J 37/3405 (2013.01); H01J 37/3426 (2013.01)] | 5 Claims |
1. A sputtering target comprising a target material, wherein a sputtering face of the target material has a circular shape and a ramp, wherein
the target material includes a flat circular first region positioned at a center of the sputtering face, and a flat ring-shaped second region positioned around the first region, wherein
the ramp has been provided so as to reduce a thickness of the target material, toward inner part of the sputtering face in the radial direction of the sputtering face between the first region and the second region, wherein
a diameter of the first region accounts for 32% or more and 58% or less of a diameter of the sputtering face, and
a thickness of the ramp is 0.5 mm to 5 mm, wherein
the thickness of the first region is 10 mm to 30 mm, wherein
the ring width of the second region is 5 mm to 75 mm.
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