US 11,862,434 B2
Substrate processing apparatus
Young Jae Ma, Gyeonggi-do (KR); Sung Jin Yoon, Gyeonggi-do (KR); Hyo Jeong Seo, Gyeonggi-do (KR); and Jong Woo Park, Gyeonggi-do (KR)
Assigned to PSK INC., Hwaseong-si (KR)
Filed by PSK INC., Gyeonggi-do (KR)
Filed on Dec. 10, 2020, as Appl. No. 17/117,720.
Claims priority of application No. 10-2019-0169528 (KR), filed on Dec. 18, 2019.
Prior Publication US 2021/0193440 A1, Jun. 24, 2021
Int. Cl. H01J 37/32 (2006.01); C23C 4/04 (2006.01)
CPC H01J 37/32477 (2013.01) [H01J 37/321 (2013.01); H01J 37/3222 (2013.01); C23C 4/04 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A substrate processing apparatus, comprising:
a process treating unit providing a treating space performed treating the substrate; and
a plasma generation unit generating plasma by discharging a process gas, and supplying the plasma to the treating space,
wherein the plasma generation unit comprises:
a plasma chamber having a plasma generating space;
an antenna wound to surround the plasma chamber outside the plasma chamber; and
a first coating film covering inside walls of the plasma chamber and comprising yttrium fluoride (YF3), and
wherein, when viewed from a front cross-section of the plasma chamber, a thickness of the first coating film in an upper area, including an uppermost edge, of the plasma chamber and in a lower area, including a bottommost edge, of the plasma chamber is more than the thickness of the first coating film in a central area, including a centerline, of the plasma chamber,
wherein the antenna is an inductively coupled plasma (ICP) antenna,
wherein a power source applying a power to the antenna is connected to one end of the antenna, and an opposite end of the antenna is grounded, and
wherein, when viewed from the front cross-section of the plasma chamber, the one end and the opposite end of the antenna are provided in a height corresponding to the upper area and the lower area of the plasma chamber.