US 11,860,549 B2
Method for controlling a manufacturing apparatus and associated apparatuses
Wolter Siemons, Veldhoven (NL); Daan Maurits Slotboom, Wolphaartsdijk (NL); and Erik Peter De Kort, Veldhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/251,419
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed May 1, 2019, PCT No. PCT/EP2019/061136
§ 371(c)(1), (2) Date Dec. 11, 2020,
PCT Pub. No. WO2019/242922, PCT Pub. Date Dec. 26, 2019.
Claims priority of application No. 18178397 (EP), filed on Jun. 19, 2018; and application No. 18197882 (EP), filed on Oct. 1, 2018.
Prior Publication US 2021/0247700 A1, Aug. 12, 2021
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70633 (2013.01) [G03F 7/70725 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for determining a correction for control of at least one manufacturing apparatus used in a manufacturing process for providing structures to a region on a substrate, the region comprising a plurality of sub-regions; the method comprising:
obtaining measurement data relating to a process parameter of the manufacturing process for the region;
determining, by a hardware computer, a first layer correction for the at least one manufacturing apparatus based on the measurement data, wherein the first layer correction is configured for application with respect to a boundary region and a remainder of at least one of the sub-regions and configured to better correct the process parameter across the boundary between two of the sub-regions with respect to within the remainder of the two sub-regions in providing structures to a first layer of the substrate and wherein the determining of an amount or type of first layer correction for the boundary region of the at least one sub-region is dependent on the determining of an amount or type of first layer correction for the remainder of the at least one sub-region or vice versa;
determining a second layer correction for control of the manufacturing process based on a separate consideration for each of the plurality of sub-regions of the first layer, the second layer correction for providing second layer structures to the region on the substrate in a second layer and configured for a different size area than the first layer correction; and
applying the first layer and/or second layer correction for control of the at least one manufacturing apparatus and/or outputting a signal representing, or based on, the first layer and/or second layer correction to a tool or system for enabling control of the at least one manufacturing apparatus.