US 11,860,539 B2
Polyvinyl acetate based photopolymer
Toshifumi Komatsu, Duluth, MN (US)
Assigned to SHOWA KAKO CORPORATION, Suita (JP)
Appl. No. 18/249,011
Filed by SHOWA KAKO CORPORATION, Osaka (JP)
PCT Filed Oct. 13, 2021, PCT No. PCT/US2021/054701
§ 371(c)(1), (2) Date Apr. 13, 2023,
PCT Pub. No. WO2022/081652, PCT Pub. Date Apr. 21, 2022.
Claims priority of provisional application 63/061,443, filed on Oct. 13, 2020.
Prior Publication US 2023/0288803 A1, Sep. 14, 2023
Int. Cl. G03F 7/038 (2006.01); C08F 118/08 (2006.01)
CPC G03F 7/0388 (2013.01) [C08F 118/08 (2013.01); C08F 2810/30 (2013.01)] 11 Claims
 
1. A photosensitive resin composition in form of an aqueous emulsion comprising:
a water-based, water-processable, non-saponified, and non-hydrolyzed vinyl acetate polymer to which at least one group selected from the group consisting of a styrylpyridinium group and a styrylquinolinium group has been added, the polymer being obtained by adding from 0.01 to 5 mole % of the at least one group selected from the group consisting of the styrylpyridinium group and the styrylquinolinium group to a vinyl acetate polymer having a polymerization degree in a range from 100 to 5000 and a saponification degree of zero, and the styrylpyridinium group and the styrylquinolinium group being one or more of respective formulae in the following formulae (A) and (B):

OG Complex Work Unit Chemistry
wherein A represents:

OG Complex Work Unit Chemistry
or

OG Complex Work Unit Chemistry
wherein, R1 is a hydrogen atom or an alkyl or aralkyl group which optionally contains a hydroxyl group, a carbamoyl group, an ether bond, or an unsaturated bond; R2 is a hydrogen atom or a lower alkyl group; and X− is a halide ion, a phosphate ion, a p-toluene-sulfonate ion, a methyl sulfate ion, an ethyl sulfate ion, or a mixture of two or more of said ions

OG Complex Work Unit Chemistry
wherein A is:

OG Complex Work Unit Chemistry
or

OG Complex Work Unit Chemistry
wherein, R1 is a hydrogen atom or an alkyl or aralkyl group which optionally contains a hydroxyl group, a carbamoyl group, ether bond, or an unsaturated bond; R2 is a hydrogen atom or a lower alkyl group; and X− is a halide ion, a phosphate ion, a p-toluene-sulfonate ion, a methyl sulfate ion, an ethyl sulfate ion, or mixture of two or more of said ions.