CPC C23C 16/26 (2013.01) [H01L 21/02115 (2013.01); H01L 21/02274 (2013.01); H01L 23/53295 (2013.01)] | 16 Claims |
1. A method of depositing a film, the method comprising:
exposing a substrate to a first carbon precursor to form a first precursor terminated surface on the substrate;
exposing the first precursor terminated surface to a second carbon precursor to form a conformal carbon polymer film on the substrate; and
annealing the carbon polymer film at a temperature up to 400° C., wherein annealing the carbon polymer film causes the carbon polymer film to decrease in thickness less than 20%.
|