US 11,858,001 B2
System and a method for cleaning a device
Edward Haeggström, Helsinki (FI); Petro Moilanen, Kinkomaa (FI); Ari Salmi, Helsinki (FI); Timo Rauhala, Helsinki (FI); and Kasper Peterzéns, Espoo (FI)
Assigned to ALTUM TECHNOLOGIES OY, Helsinki (FI)
Appl. No. 17/614,997
Filed by ALTUM TECHNOLOGIES OY, Helsinki (FI)
PCT Filed May 26, 2020, PCT No. PCT/FI2020/050351
§ 371(c)(1), (2) Date Nov. 29, 2021,
PCT Pub. No. WO2020/240086, PCT Pub. Date Dec. 3, 2020.
Claims priority of application No. 20195462 (FI), filed on May 31, 2019.
Prior Publication US 2022/0219199 A1, Jul. 14, 2022
Int. Cl. B06B 3/00 (2006.01); B06B 1/06 (2006.01); B08B 3/12 (2006.01); B08B 9/032 (2006.01); F28G 7/00 (2006.01)
CPC B06B 3/00 (2013.01) [B06B 1/0611 (2013.01); B08B 3/12 (2013.01); B08B 9/0326 (2013.01); F28G 7/00 (2013.01); B08B 2209/005 (2013.01); B08B 2209/032 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A system for cleaning a device for holding fluid, the system comprising
mechanical wave generating means and
a waveguide comprising
a first end adapted to be in contact with an outer surface of the device
a second end wherein the second end is in contact with the mechanical wave generating means,
wherein
the waveguide comprises a cavity comprising a base portion, the base portion separated from the second end by a distance I,
the mechanical wave generating means is adapted to emit mechanical waves through the waveguide to the outer surface,
the distance I is such that when the mechanical wave generating means emits a succession of mechanical waves through the waveguide to the outer surface, there is an antinode positioned in the waveguide at the distance I from the second end,
a maximum diameter Dmax of the waveguide is less than ½ of a wavelength of the mechanical waves and wherein
the ratio of diameter d of the base portion to the diameter D of the waveguide at the distance I is from 0.2 to 0.9.